Formation mechanism of cobalt silicide on silica by chemical vapor deposition of Co(SiCl3)(CO)4
Release time:2022-10-04
Hits:
First Author:
赵安琪
Correspondence Author:
chenxiao,管婧超,Christopher T. Williams,Changhai Liang
Date of Publication:
2022-10-02
Journal:
PHYSICAL CHEMISTRY CHEMICAL PHYSICS
Document Type:
J
Volume:
13
Issue:
20
Page Number:
9432-9438
Translation or Not:
no
